In this dissertation, we have developed a lithography process based on the atomic force microscopy of technique. The study of the lithography process starts with the deposition and characterization of amorphous arsenic sulfide thin films (a-As2S3) in silicon substrates and the deposition of a metallic aluminum layer, used as mask, on the surface of the a-As2S3. An atomic force microscope was used to write patterns in a controlled way on the metallic layer. Therefore, the influence of microscope feedback system on the accomplishment of the lithography was analyzed. In order to transfer the lithographed pattern to a silicon substrate, the a- As2S3 was exposed to a UV light source and was dissolved with a K2CO3 solution. Then, a thin gold layer was deposited by sputtering DC, and a new dissolution, now with NaOH was performed, leading to the deposition of Au nanostructures onto the silicon substrate.