This work can be divided into three main steps: synthesis of nanoparticles, thin film deposition and electron beam lithography. The magnetic nanoparticles were synthesized by co-precipitation method from iron II sulfate (FeSO4), ferric chloride (FeCl3) and ammonium hydroxide (NH4OH) at room temperature. A small amount of sodium nitrate (NaNO3) was added to avoid the cluster formation, which was very efficient. Then the magnetite thin films were produced using the sputtering RF (radio frequency source) system. The targets were produced by compression of magnetite nanoparticles previously produced in the first step. The thin films were deposited on a silicon substrate. The formation of the magnetite after the deposition was confirmed by x-ray diffraction and vibrating sample magnetometer. The arrays of magnetite were made once the deposition parameters were controlled. The electron beam lithography has been produced on silicon substrate covered of PMMA (polymethylmethacrylate) resist 250 nm thick. Were produced periodic arrays of basic forms a way to test the technique of lithography, a square micron circles 1 μm, 500 nm and 250 nm in diameter formed of a magnetite film 80 nm thick. The film thickness, shape, size and separation of the figures which comprise standards lithographed can influence the ease with which the mask is withdrawn from PMMA.