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Título: NITROGEN INCORPORATION INTO AMORPHOUS FLUORINATED CARBON FILMS
Autor: CARLOS MANUEL SANCHEZ TASAYCO
Colaborador(es): FERNANDO LAZARO FREIRE JUNIOR - Orientador
Catalogação: 02/JUL/2003 Língua(s): PORTUGUESE - BRAZIL
Tipo: TEXT Subtipo: THESIS
Notas: [pt] Todos os dados constantes dos documentos são de inteira responsabilidade de seus autores. Os dados utilizados nas descrições dos documentos estão em conformidade com os sistemas da administração da PUC-Rio.
[en] All data contained in the documents are the sole responsibility of the authors. The data used in the descriptions of the documents are in conformity with the systems of the administration of PUC-Rio.
Referência(s): [pt] https://www.maxwell.vrac.puc-rio.br/projetosEspeciais/ETDs/consultas/conteudo.php?strSecao=resultado&nrSeq=3698&idi=1
[en] https://www.maxwell.vrac.puc-rio.br/projetosEspeciais/ETDs/consultas/conteudo.php?strSecao=resultado&nrSeq=3698&idi=2
DOI: https://doi.org/10.17771/PUCRio.acad.3698
Resumo:
The tribological properties of carbon coatings of hard magnetic disks played an important role for the continuous increase of their storage capacity. The mechanical and structural properties were also important: high density, hardness and wear resistance, and low friction coefficient. In this work, we study the effects of the nitrogen incorporation into fluorinated carbon films (a-C:H:F) deposited by plasma enhanced chemical vapor deposition. The film properties were investigated by using a multitechnique approach: nuclear techniques (Rutherford backscattering, elastic recoil and nuclear reaction analyses), x-ray photoelectron spectroscopy, internal stress measurements by perfilometry, Raman and Infrared spectroscopies, atomic force microscopy and contact angle measurements. Films were deposited changing the N2 partial pressure in a precursor atmosphere also composed by a fixed CH4-CF4 mixture (1:2) (PN2: 0 - 60%), with the self-bias voltage of -350V. The results show that the film properties are controlled by the nitrogen incorporation, with an important fluorine content reduction. The internal stress reduction may result in an increase of the film adhesion. However, the contact angle decreases upon nitrogen incorporation, resulting in an increase of the friction coefficient. New studies with the goal of obtain a simultaneous increase of both fluorine and nitrogen content are suggested.
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