Título: | NITROGEN INCORPORATION INTO AMORPHOUS FLUORINATED CARBON FILMS | ||||||||||||||||
Autor: |
CARLOS MANUEL SANCHEZ TASAYCO |
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Colaborador(es): |
FERNANDO LAZARO FREIRE JUNIOR - Orientador |
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Catalogação: | 02/JUL/2003 | Língua(s): | PORTUGUESE - BRAZIL |
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Tipo: | TEXT | Subtipo: | THESIS | ||||||||||||||
Notas: |
[pt] Todos os dados constantes dos documentos são de inteira responsabilidade de seus autores. Os dados utilizados nas descrições dos documentos estão em conformidade com os sistemas da administração da PUC-Rio. [en] All data contained in the documents are the sole responsibility of the authors. The data used in the descriptions of the documents are in conformity with the systems of the administration of PUC-Rio. |
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Referência(s): |
[pt] https://www.maxwell.vrac.puc-rio.br/projetosEspeciais/ETDs/consultas/conteudo.php?strSecao=resultado&nrSeq=3698&idi=1 [en] https://www.maxwell.vrac.puc-rio.br/projetosEspeciais/ETDs/consultas/conteudo.php?strSecao=resultado&nrSeq=3698&idi=2 |
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DOI: | https://doi.org/10.17771/PUCRio.acad.3698 | ||||||||||||||||
Resumo: | |||||||||||||||||
The tribological properties of carbon coatings of hard
magnetic disks played an important role for the continuous
increase of their storage capacity. The mechanical and
structural properties were also important: high density,
hardness and wear resistance, and low friction coefficient.
In this work, we study the effects of the nitrogen
incorporation into fluorinated carbon films (a-C:H:F)
deposited by plasma enhanced chemical vapor deposition. The
film properties were investigated by using a multitechnique
approach: nuclear techniques (Rutherford backscattering,
elastic recoil and nuclear reaction analyses), x-ray
photoelectron spectroscopy, internal stress measurements by
perfilometry, Raman and Infrared spectroscopies, atomic
force microscopy and contact angle measurements. Films were
deposited changing the N2 partial pressure in a precursor
atmosphere also composed by a fixed CH4-CF4 mixture (1:2)
(PN2: 0 - 60%), with the self-bias voltage of -350V. The
results show that the film properties are controlled by the
nitrogen incorporation, with an important fluorine content
reduction. The internal stress reduction may result in an
increase of the film adhesion. However, the contact angle
decreases upon nitrogen incorporation, resulting in an
increase of the friction coefficient. New studies with
the goal of obtain a simultaneous increase of both fluorine
and nitrogen content are suggested.
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