This work presents the effects on the mechanical, structural and tribological properties of the incorporation of fluorine in amorphous carbon films deposited by PECVD (Plasma Enhanced Chemical Vapor Deposition). The thermal stability of fluorinated amorphous carbon films was also studied. The films were deposited using mixtures of C2H2 and CF4 gases with a self-bias voltage of - 350V. The concentration of CF4 in the gases mixture was varied from 0% to 90%. The thermal stability was investigated in films deposited with 50% C2H2 and 50% CF4 as precursor atmosphere. These films were annealed in the temperatures range of 200oC to 600oC during 30 minutes for each sample. The mechanical, structural and tribological properties were studied using nuclear techniques (Rutherford Backscattering and Elastic Recoil Detection Analysis), Raman and X-ray photoelectron spectroscopy, profilometry (for internal stress) and nanoidentation (for hardness), atomic force microscopy and contact angle measurements. The results showed that fluorine incorporation produces films with properties resembling the Teflon's properties. The films rich in fluorine appear to have lower density, more hydrophobicity and lower friction coeficient than amorphous carbon films. They are also softer than them. The thermal annealing shows that films were thermally stable within temperatures up to 300oC. Above this temperature the films tend to loose fluorine and their properties change revealing a more graphitic structure.