The main purpose of the present work was the study of the effects on the structural, mechanical and tribological properties of the incorporation of nitrogen in titanium diboride films (TiB2) grown by reactive dc magnetron sputtering. Ti-BN coatings with different N contents were deposited on Si (100) substrates from a TiB2 target. The sputtering was carried out in an Ar-N2 gas mixture with a substrate bias voltage in the range between +100V e -100V. The effects of the nitrogen content and the influence of substrate bias voltage on the coatings properties were studied by Rutherford Backscattering Spectrometry (RBS), XRay photoelectron spectroscopy (XPS), X-Ray diffraction (XRD), profilometry (internal stress measurements), atomic force microscopy (AFM) and contact angle measurements. The results of the present work show that nitrogen incorporation produces films with higher compressive internal stress. However, a positive substrate bias reduces the compressive stress, thus resulting in a better adhesion to the substrate. The XPS results showed that the TiB2, TiN and BN phases are present in the Ti-B-N films. Characterization by XRD determined the nanocrystalline structure of Ti-B-N coatings. Measurements by AFM revealed low surface roughness values.